Low temperature diamond film coating opens up new applications for electronic equipment

Abstract Recently, the Journal of Applied Physics published a new method for low-temperature growth of diamond films, which opened a new door for the new application of electronic devices in the future. In industrial and high-tech equipment applications, diamonds have excellent hardness, optical transparency, smoothness, and
Recently, the Journal of Applied Physics published a new method for low-temperature growth of diamond films, which opened a new door for the future application of electronic devices.


In industrial and high-tech equipment applications, diamonds are attracting attention for their excellent hardness, optical transparency, smoothness, and resistance to chemical corrosion, radiation, and electric fields. In recent years, researchers have incorporated semiconductor boron into the diamond production process, which has been made conductive by plating. In the past, the high temperature conditions required to prepare diamond-coated films were prone to damage very sensitive electronic devices, such as biochemical sensors, semiconductors, and photonic optics; while in electronic devices, diamond-doped coatings made it more difficult for electronic devices to have diamond-like properties. Adding difficulty.

A research team from Advanced Diamond Technologies of Illinois, USA, has recently developed a low-temperature (460-600 ° C) grown boron-doped diamond film that has been successfully plated on many electronic devices.

Although the method of low temperature deposition of boron-doped diamond films is not the latest technical concept, researchers have not found high quality and commercially productive methods in the prior art and literature. Therefore, they successfully developed high-quality diamond films by lowering the temperature and adjusting the ratio of methane to hydrogen; and the properties of the films such as conductivity and smoothness did not change significantly compared with the films grown at high temperatures. .

In view of this, scientists also want to further optimize the method, expecting to deposit boron-doped diamond films at low temperatures below 400 °C.

"The lower the deposition temperature, the more electronic devices we can use." Hongjun Zeng said, "This will allow electronic product types to develop in ultra-thin, smooth, and conductive diamond plating."

The study was published in the Journal of Applied Physics by Hongjun Zeng, Prabhu U. Arumugam, Shabnam Siddiqui and John A. Carlisle.

The research was supported by Advanced Diamond Technologies and Argonne National Laboratory. (Compiled from Science Daily: 'Low Temperature Boron Doped Diamond' Translation: Wang Xian)